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Tungsten Alloy Sputtering Target

Tungsten Alloy Sputtering Target

Tungsten Alloy Sputtering Target Tungsten titanium alloy sputtering target can be used to make the diffusion barrier for semiconductor chips, the new solar cell and the ceramic thin film circuit. Tungsten silicon alloy sputtering target can be used for the ohmic contact layer of the...

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Tungsten Alloy Sputtering Target


Tungsten titanium alloy sputtering target can be used to make the diffusion barrier for semiconductor chips, the new solar cell and the ceramic thin film circuit.

Tungsten silicon alloy sputtering target can be used for the ohmic contact layer of the semiconductor chips.

Type

W

(wt%)

Ti

(wt%)

Si

(wt%)

Purity

(wt%)

Density

(%)

Grain   Size  (μm)

Dimension   (max.mm)

Ra

WTi10

90±0.5

10±0.5

/

99.9-99.999

≥99

10

?400×40

≤1.6

WTi20

80±0.5

20±0.5

/

99.9-99.995

≥99

10

?400×40

≤1.6

WSi10

90±0.5

/

10±0.5

99.9-99.999

≥99

10

?400×40

≤1.6

WSi20

80±0.5

/

20±0.5

99.9-99.999

≥99

10

?400×40

≤1.6


If you are looking for tungsten alloy sputtering target, welcome buy the quality and durable TUNGSTEN for sale from us. We are one of the leading aluminum products manufacturers and suppliers in China. We'll offer you competitive price and excellent service.

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