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RO 5400 tantalum and tantalum alloy targets

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China 99.95% Mo1 Targets with Bright Surface and Thickness Tolerance for Seller

China 99.95% Mo1 Targets with Bright Surface and Thickness Tolerance for Seller

Name:Mo1 targets Model Number:Mo1 Size:2.0-60mm*20-500mm*20-1000mm Application:industrial/electronic, high temperature Dimensions:As customer requirements Chemical Composition:Mo>=99.95% Type:high quality molybdenum plate Density:10.2g/cm3 Melting point:2610 Surface:polishing,Black,Sintering...

Industrial Titanium Alloy and Pure Titanium Tube for Heat Exchanger and Condenser with ASTM B338

Industrial Titanium Alloy and Pure Titanium Tube for Heat Exchanger and Condenser with ASTM B338

Titanium is a chemical element, chemical symbol Ti and atomic number 22, in the chemical elements of periodic table is located in the fourth period, the first IVB clan. Titanium is a silvery white Transition metal , light weight, high strength, with a metallic luster, wet chlorine corrosion...

Industrial Titanium Alloy and Pure Titanium Welded Tube for Heat Exchanger and Condenser with ASTM B338

Industrial Titanium Alloy and Pure Titanium Welded Tube for Heat Exchanger and Condenser with ASTM B338

Item:Titanium tube for heat exchange Grade:Gr1,Gr2,Gr3,Gr5,Gr7,Gr9,Gr11,Gr12, Standard:ASTM 338/861/862,ASTM F136,ASTM F67,AMS,GOST22897-86 Application:aerospace, shipbuilding, military machinery, medical apparatus and instruments, anti-corrosion chemical equipments, energy and heat exchange...

Bright Gr5 Titanium and Titanium Alloy Plate for Aerospace and Aviation AMS 4911

Bright Gr5 Titanium and Titanium Alloy Plate for Aerospace and Aviation AMS 4911

titanium plate for aerospace and aviation 1) Pure titanium plate 2)titanium foil、3)titanium alloy plate、4)titanium strip Size: normal size (δ0.5~δ60.0)mm*(1000~1250)mm*(2000~6000)mm、 Large size(δ3.0~δ60.0)mm*(1500~2500)mm*(6000~9000)mm、 Cold titanium plate In Coil (δ0.5~δ2.0)mm*(1000~1250)mm*L、...

Tantalum Rod Bar

Tantalum Rod Bar

Dimension: Note: 10" (254mm) gage length to 0.050"(1.27mm) diameter and 1" (25.4mm) or 2"(50.8mm) gage length over 0.050"(1.27mm) diameter Advantages of Tantalum Rod 1. Excellent corrosion resistance 2. High temperature strength 3. Easy to machine 4. Good biocompatibility

Tantalum Rod Bar

Tantalum Rod Bar

Tantalum has good thermal conductivity, and is used is in the manufacture of heating elements, vacuum tubes and other high temperature parts. Another major use of tantalum is for electronic components, and due to its absorption properties, tantalum is an excellent getter of residual gasses in...

Pure Tungsten Alloy Targets W1 with Bright Surface

Pure Tungsten Alloy Targets W1 with Bright Surface

Tungsten rods (bars) are used to make emission cathodes, high temperature forming rods, support wires, lead-in wires, printer pins, various electrodes, heating elements of quartz furnace, etc. Tungsten Crucible W crucible can be widely used for sapphire crystal growth, quartz glass melting,...

Industrial Pure Titanium and Titanium Alloy Tube for Heat Exchanger and Condenser with ASTM B337

Industrial Pure Titanium and Titanium Alloy Tube for Heat Exchanger and Condenser with ASTM B337

1)Introduce Titanium is a chemical element, chemical symbol Ti and atomic number 22, in the chemical elements of periodic table is located in the fourth period, the first IVB clan. Titanium is a silvery white Transition metal , light weight, high strength, with a metallic luster, wet chlorine...

Pure Titanium and Titanium Alloy Targets Gr1 and Gr2 with Bright Surface

Pure Titanium and Titanium Alloy Targets Gr1 and Gr2 with Bright Surface

1:Specification Name:titanium targets Material:Gr1,Gr2 Surface:Bright ,lathe Size:3.0-300mm Craft :polished、lathed、anodize 2.Quality control Shaanxi Aone titanium metals have been got the ISO13485:2003;ISO9001:2003 Certification, and strict according to modern enterprise management system to...

99.95% Pure Tungsten Targets with W1 ASTM B760

99.95% Pure Tungsten Targets with W1 ASTM B760

Tungsten titanium alloy sputtering target can be used to make the diffusion barrier for semiconductor chips, the new solar cell and the ceramic thin film circuit. Tungsten silicon alloy sputtering target can be used for the ohmic contact layer of the semiconductor chips.

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