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Niobium Sputtering Target

Niobium Sputtering Target

Specifications Niobium Sputtering Target 1.Grade: Nb1, Nb2, Nb-Ti, RO4200, RO4210, Nb-Alloy 2.Size: Thick 0.1mm min. W 800mm max. L 3000mm max. 3.Purity: ≥99.95% or As per your demand 4.Certification: ISO9001:2008,ISO14001:2004,CE 5.Shape: Round or Square Plate/Sheet or Customizable

Product Details

Specifications

Niobium Sputtering Target

1.Grade:  Nb1, Nb2, Nb-Ti, RO4200, RO4210, Nb-Alloy

2.Size: Thick 0.1mm min. W 800mm max. L 3000mm max.

3.Purity: ≥99.95% or As per your demand

4.Certification: ISO9001:2008,ISO14001:2004,CE

5.Shape: Round or Square Plate/Sheet or Customizable

6.Standards: 

7.Applications: Semiconductor materials, vacuum coating, sintering trays and boats, special chemical applications.

8.Product Feature: High melting point,  high-density, high temperature oxidation resistance, long service, resistance to corrosion.

99.95% niobium target Chemical Composition 

Chemical Composition (%) 


Nb

Fe

Si

Ni

W

Mo

Ti

Ta

O

C

H

N

Nb1

Remainder

0.003

0.002

0.002

0.003

0.004

0.001

0.06

0.018

0.006

0.0016

0.001

Nb2

Remainder

0.02

0.02

0.004

0.02

0.02

0.005

0.13

0.03

0.01

0.0012

0.01

Applications


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      1. For producing electric light source parts and electric vacuum components.

      2. For producing heating elements and refractory parts in high temperature furnaces.

      3. For producing medical laboratory equipment.

      4. Used as electrodes in the field of rare earth industry.

      5. Used in the manufacture of weapons. 

      6. Used to make decorations and etc.

 

If you are looking for niobium sputtering target, welcome buy the quality and durable Titanium Plate for sale from us. We are one of the leading aluminum products manufacturers and suppliers in China. We'll offer you competitive price and excellent service.

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